In this chapter, the fabrication and replication of periodic nanopyramid structures suitable for antireflection and self-cleaning surfaces are presented. Laser interference lithography (LIL), dry etching, wet etching, and UV nanoimprint lithography (UV-NIL) are employed for the fabrication and replication of periodic nanopyramid structures. Inverted nanopyramid structures were fabricated on Si substrates by LIL and subsequent pattern transfer process using reactive ion etching, followed by potassium hydroxide (KOH) wet etching. The fabricated periodic inverted nanopyramid structures were utilized as a master mold for the nanoimprint process. The upright nanopyramid structures were patterned on the OrmoStamp-coated glass substrate with high fidelity in the first nanoimprint process. In the second nanoimprint process, inverted nanopyramid structures were replicated on the OrmoStamp-coated substrate using the fabricated upright nanopyramid glass substrate as a mold. The replicated inverted nanopyramid structure on resist-coated substrate was faithfully resolved with the high accuracy compared to original Si master mold down to nanometer scale. Both upright and inverted nanopyramid structures can be utilized as surface coatings for light trapping and self-cleaning applications for different types of solar cell and glass surfaces.