Implementación del método Level Set para la simulación del proceso químico de atacado anisótropo húmedo aplicado para la microfabricación
Disciplines
Thesis
Spanish
ID: <
http://hdl.handle.net/10251/19214>
[EN] In this thesis it has been implemented the Level Set (LS) method in order to simulate anisotropic wet etching process used for building micro-structures. Now a days, it is used atomistic models to simulate this process, however, using the LS method could turn out in some advantages. Finally, results of both implementations are compared.